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SOLUTIONS
Lithography system
We have a direct-write lithography system for microelectronic fabrication (Maskless). A key advantage of maskless lithography is the ability to change lithography patterns from one run to the next, without designs incurring the cost of generating a new photomask. This feature gives a great advantage for developing work to change the exposed patterns easily with no extra overhead cost. We produce its design as well as for other fabless companies, which make it a pure-play semiconductor foundry for MEMS and NEMS.
MEMS & NEMS
MEMS are silicon-based devices that can serve as sensors, actuators, or passive mechanical structures. MEMS are manufactured on silicon or glass wafers using techniques initially developed by the semiconductors industry for forming micron-scale features. We have expertise in the design, fabrication, process, characterization, and bonding of the complete MEMS devices. Also, we have the capability to fabricate a variety of MEMS, e.g. Accelerometers, vibratory Gyroscopes, Pressure Sensors and other devices.
Tools & Equipments
We have the top and advanced tools such as the Electron Beam Lithography tool, Direct Laser Writing, Deep Reactive Ion Etching, advanced chemical and mechanical polishing, Copper Electroplating, and other instruments. Metrology equipment and tools are an essential part of our facility. In addition, we own Microsystem Analyzer to characterize the motion of MEMS dies in the wafer-level stage and all other advanced metrology tools. We have advanced laboratories for tests and measurements in wafer level and package level testing.
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